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Metal Sputtering Target
Created with Pixso. WTi Tungsten Titanium Target Proportioning 90:10 Customizable Size
Detail Information
Place of Origin:
china
Certification:
ISO9001、ISO14001、ISO45001、IAFT16949
Purity:
99.5%-99.995%
Proportioning:
Standard Ratio: 90:10
Name:
Tungsten Titanium Target (WTi)
Forming Process:
Hot Pressing Sintering, Hot Isostatic Pressing
Product Specifications:
Customizable Size, Max O400mm, Max Length 80omm Customizable Size, Max 040omm, Max Length 800mm
Application Scenarios:
Microelectronic Devices, Optical Device Manufacturing, Decorative And Functional Coatings
Packaging Details:
Vacuum-sealed packaging, case-packed for storage and transport
Supply Ability:
Stable supply
Highlight:

WTi Tungsten Titanium Target

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Tungsten Titanium Target 90:10

Product Description

Tungsten Titanium target is a high-performance alloy target made from tungsten (W) and titanium (Ti), combining tungsten's high melting point, high temperature resistance, and wear resistance with titanium's light weight, corrosion resistance, and good adhesion. It can form uniform and dense thin films through physical vapor deposition (PVD) techniques like sputtering and evaporation. Tungsten titanium targets are widely used in semiconductor, microelectronics, optical devices, and decorative coatings, making them an important choice for manufacturing high-performance thin films.

Key Advantages of Tungsten Titanium Target

 

l High Density and Uniformity

 

The deposited thin films are uniform, with a smooth surface and strong adhesion, effectively preventing cracking or peeling of the film.

 

 

l High Temperature and Corrosion Resistance


Tungsten provides excellent high-temperature stability and wear resistance, while titanium offers oxidation and corrosion resistance, making it suitable for various high-temperature or harsh process environments.

 

 

l Excellent Mechanical Properties


The thin films have high hardness, are wear-resistant and scratch-resistant, improving the durability and lifespan of the final product.

 

Main Applications of Tungsten Titanium Target

 

l  Semiconductor Manufacturing


Used for interconnection layers, contact hole metallization, and protective film deposition in integrated circuits, providing high conductivity, stability, and high-temperature resistance, ensuring long-term reliable operation of internal components in chips.

 

 

l Microelectronics Devices


Used in MEMS devices, electrodes, sensors, and other microelectronic components, improving conductivity, wear resistance, and long-term stability, enhancing device performance and reliability.

 

 

l Optical Device Manufacturing


Used in optical lenses, filters, and laser devices to control transmission and reflection rates through coating, while enhancing the wear resistance and corrosion resistance of optical elements, suitable for precision optical instruments and laser systems.

 

 

l Decorative and Functional Coatings


Used to form high-gloss, wear-resistant, and corrosion-resistant thin films on the surfaces of electronic casings, metal products, and high-end household appliances, combining aesthetic appeal with functional protection, extending the product's lifespan.