solutions
2026-03-26
Semiconductor
Main Target Materials:Cu,Ti, W, SS, AI, Si, Ni, Mo, Cr, Ta, Ag, Au, Pt, Ir, Sc, AISC, NiFe, NiCr, NiCu, WTi, AICu, PZT, LNO, NiV Evaporation Materials:Cu, Ni, Ti, W, AI, Mo, Cr, Ta, Ag, Au, Pt, Ir, Y These target materials are critical and indispensable components in semiconductor manufacturing. ...
2026-03-27
Photovoltaic Solar Cells
Main Target Materials:AMTO, ICO, IXO, ITO, AZO, MZO, CTO, ZTO, GAZO, ZnO, NiO, SnO₂, Cu, Ni, Ti, Mo, In, Cr, Si, CuGa, ZnTe, CuNi Evaporation Materials:ITO, IWSO, IXO, ICO, IMO, ZTO, AZO, GAZO, NiO, Mo, IZRO, ZnO, SnO₂, Cu, In, Se The rapid evolution of photovoltaic technology—encompassing emerging ...
2026-03-27
Optics
Main Target Materials:Si, SiB, SiO₂, Nb, Nb₂Ox, Ti, TiOX, Al, Cr, Zr, Hf, Ta, Ge Evaporation Materials:MgF₂, Nb₂O₅, Al₂O₃, Ta₂O₅, HfO₂,Ti₃O₅, SiO₂/AI₂O₃, H4, YbF₃, SiO₂, TiO₂, ZrO₂ These target materials are essential for advanced optical thin-film deposition, delivering high uniformity, density, ...
2026-03-27
Smart Touch And Display
Main Target Materials:Si, Nb, Cu, AI, Mo, Ti, Ni, Ag, Yb, SiB, GXO, MoOX, Nb₂Ox, MoNb,AINd, CuNi Evaporation Materials:Ag, AI, Yb In the production of smart touchscreens and various flat-panel displays, sputtering targets are core materials for preparing transparent conductive films (TCFs), ...
2026-03-27
Hard Coating & Functional Coating
Main Target Materials:Si, Cr, Cu, AI, Ti, Nb, Zr, In, Sn, SS, C, Nb₂Ox, CrSi, CrAl, SiAI,TiAI, InSn, WTi, WC, WCr, TiB₂ The above sputtering targets are core materials for preparing both functional films and surface enhancement layers in demanding hard and decorative coatings. Our high-purity, high...
2026-03-27
Low-E Glass
Main Target Materials:AZO, ZTO, SiAI, SiZr, ZrOx, NiCr, SiAIZr, ZnSn, ZnAI, TiOX, Nb₂Ox,Ag, Nb, Cr Functional coatings for glass deposit highly-transparent, highly-uniform, wear-resistant, and corrosion-resistant films. These coatings provide essential functions such as heat insulation, conductivity...
2026-03-27
Composite Collector
Main Target Materials:Cu, NiCr, Al, Cu-alloy In the preparation of composite current collectors, sputtering targets are key materials for forming high-performance conductive films and interface layers. High-purity, high-uniformity targets deposit dense, continuous films that improve the conductivity...
2026-03-27
Rare-Earth Permanent
Main Target Materials:Tb, Dy, Tb-alloy Used for film deposition surface coating, and interface modification to enhance the performance and stability of magnetic materials. High-purity targets can deposit uniform, dense functional films, improving the corrosion resistance and thermal stability of ...
2026-03-27
Electrochromism
Main Target Materials:ITO, Ni, W, V, Cu, NiO, WO, VO, WNi, MoNb, AINd These materials enable the deposition of high-purity, high-uniformity, dense, and stable films with precisely controlled optical properties. These high-performance targets not only improve response speed and color uniformity but ...
2026-03-27
RPD / Evaporation Material
Main Target Materials:Cu, Ti, Al, RPD Materials, Yb, Ni, Ag, ITO, ZrO₂, H4 These materials can deposit high-purity, highly-uniform, dense, and stable films, achieving excellent optical, electrical, and mechanical properties. High-performance targets ensure material consistency and stability during ...
2026-03-27
Powder
Main Powders:Glass Powder, Nanomaterials, Silver Powder, High-Purity Ceramic Powder Our powder products feature a wide range of high-performance materials, including specialty glass powder, nano oxides, silver powder, and high-purity ceramic powder. These materials are widely used across diverse ...
2026-03-27
Pastes
Main Target Materials:Ag, Al, Cu, etc. Electronic paste is a specialized functional material formulated using high-purity metal or oxide powders as core components, precisely combined with organic carriers and specific additives. It exhibits excellent electrical conductivity, thermal conductivity, ...
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