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Evaporation Materials
Created with Pixso. High Purity Tantalum Pentoxide Ta2O5 For Optical Device Semiconductor
Detail Information
Place of Origin:
china
Certification:
ISO9001、ISO14001、ISO45001、IAFT16949
Refractive Index:
2-2.25(500nm)
Transparent Band:
350-9000nm
Name:
Tantalum Pentoxide (Ta₂O₅)
Forming Process:
Powder Metallurgy, Hot Pressing Sintering
Product Specifications:
Evaporation Particles
Application Fields:
Optical Device Manufacturing,Photovoltaic Industry, Semiconductor Manufacturing
Packaging Details:
Vacuum-sealed packaging, case-packed for storage and transport
Supply Ability:
Stable supply
Highlight:

High Purity Tantalum Pentoxide

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Tantalum Pentoxide Ta2O5

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Semiconductor Tantalum Pentoxide

Product Description

Tantalum pentoxide (Ta₂O₅) is an important functional inorganic oxide, characterized by a high dielectric constant, high refractive index, and excellent chemical stability. It is an insulator at room temperature, with a band gap of approximately 4.0–4.5 eV, and can form high-quality thin films through processes like vacuum evaporation or magnetron sputtering. Ta₂O₅ films exhibit high transparency, low absorption, and maintain stable physical and chemical properties over time, making it a key material in optical and electronic thin film manufacturing.

Outstanding Characteristics of Tantalum Pentoxide (Ta₂O₅)

 

l High Dielectric Performance


It has a dielectric constant (20 to 25) significantly higher than that of silica  which makes it suitable as a dielectric material for capacitors and high-k films.

 

l Excellent Optical Properties


It exhibits a refractive index of approximately 2.0–2.25 (at 500 nm), which is highly tunable via deposition process optimization. Coupled with superior optical transmittance, this characteristic makes it ideal for high-performance interference coatings and advanced optical systems.

 

 

l Thermal and Chemical Stability


It has exceptional thermal and chemical resilience, maintaining superior thin-film stability even when subjected to extreme temperatures and corrosive environments.

 

 

l Low Absorption Loss

Low absorption and scattering properties of the films leads to high efficiency and long lifespan for optical devices.

 

 

l High Purity


High-purity raw materials ensures a low-defect morphology during deposition. This optimization is critical for achieving the stringent performance uniformity and device stability required for next-generation electronic architectures.

 

Wide Applications of Tantalum Pentoxide (Ta₂O₅)

 

l Optical Device Manufacturing


It is used in the preparation of anti-reflection coatings (AR coatings), optical filters, high refractive index layers, and multilayer interference films.

 

 It plays a significant role in advanced optical systems by providing a high refractive index and excellent transparency, making it a critical material for high-performance interference filters, anti-reflective coatings, and optical waveguides in lenses, projectors, and laser systems..

 

 

l Photovoltaic Industry


It is used in anti-reflection coatings for solar cells to improve light absorption and energy conversion efficiency.


It enhances the stability and weather resistance of thin-film solar modules.

 

 

l Semiconductor Manufacturing


It is widely used in dielectric layers for DRAM, flash memory, and capacitors.

 

 

l As a high-k dielectric film in the semiconductor industry, it meets the demands for chip miniaturization and high performance.