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Metal Sputtering Target
Created with Pixso. Aluminum Neodymium AINd Target For Optoelectronics Industry
Detail Information
Place of Origin:
china
Certification:
ISO9001、ISO14001、ISO45001、IAFT16949
Purity:
99.99%
Proportioning:
Customizable Ratios
Name:
Aluminum Neodymium Target (AINd)
Forming Process:
Melting
Product Specifications:
Planar Targets, Rotating Targets,irregularly Shaped Targets
Application Fields:
Semiconductor Manufacturing. Display Panels, Touchscreen Technology.Photovoltaic Industry
Packaging Details:
Vacuum-sealed packaging, case-packed for storage and transport
Supply Ability:
Stable supply
Highlight:

Electronics AINd Target

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Aluminum Neodymium AINd Target

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Aluminum Neodymium Target

Product Description

Aluminum-Nd target is an alloy target composed of aluminum (Al) and neodymium (Nd) in specific proportions, commonly used in sputtering coating processes. By adding the rare earth element neodymium to the aluminum matrix, it significantly improves the structure and performance of the aluminum film, resulting in a denser, more stable, corrosion-resistant, and high-temperature resistant film layer. This target typically has high purity, high density, and excellent conductivity, making it an important functional thin film material in electronics, optoelectronics, and renewable energy fields.

Core Advantages of Aluminum-Nd Target

 

l Enhanced Thin-Films Stability

 

The addition of neodymium refines the aluminum film grains, reducing stress and pinholes, enhancing film density and adhesion, and making the film less prone to failure over extended use.

 

 

l Enhanced Corrosion and Heat Resistance

 

Compared to pure aluminum targets, films prepared with aluminum-neodymium targets show more stable performance in high-temperature and high-humidity environments, with enhanced oxidation resistance.

 

 

l Excellent Conductivity and Optical Properties

 

While maintaining good conductivity, it can also improve the reflectivity and transmittance of the film layer, meeting the needs of display and optical devices.

 

 

Main Applications of Aluminum-Nd Target

 

l  Semiconductor Manufacturing

 

Aluminum-Nd targets are used in semiconductor chips and microelectronic devices for metal interconnects, electrodes, barrier layers, or protective layers. The addition of neodymium improves the crystallization and stress state of the aluminum film, making it denser and more stable, significantly enhancing device conductivity and lifespan, and meeting the requirements of high-performance integrated circuits.

 

 

l Display Panels

 

In the manufacturing of LCD, OLED, Micro-LED, and other display panels, aluminum-Nd targets are used to prepare electrodes, backplanes, and reflective layers. Their excellent conductivity and optical reflection properties help enhance the uniformity of display brightness, reduce power consumption, and improve the durability and reliability of display panels.

 

 

l Touchscreen Technology

 

Aluminum-Nd targets can be applied in functional coatings for optical lenses, filters, laser components, etc., to control reflection, transmission, and absorption properties. The film layers are corrosion-resistant, with strong adhesion, and can maintain stable performance in high-humidity and high-temperature environments, meeting the stringent requirements of high-end optical devices.

 

 

l Photovoltaic Industry

 

Aluminum-Nd targets are commonly used as electrode or reflective layer materials in the manufacturing of crystalline silicon or thin-film solar cells. They improve the conductivity, reflectivity, and stability of the film layer, thereby enhancing the photovoltaic conversion efficiency and long-term reliability of solar cells.