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Metal Sputtering Target
Created with Pixso. Mo Metal Sputtering Target Molybdenum Sputtering Target
Detail Information
Place of Origin:
china
Certification:
ISO9001、ISO14001、ISO45001、IAFT16949
Purity:
99.95%-99.999%
Density:
10.28g/cm
Resistivity:
It Is 5.17 × 10⁻¹⁰ Ω·cm At 0℃; 24.6 × 10⁻¹⁰ Ω·cm At 800℃; And 72 × 10⁻¹⁰ Ω·cm At 2400℃
Name:
Molybdenum Target (Mo)
Forming Process:
Hot Pressing Sintering
Product Specifications:
Flat Target, Rotating Target
Application Fields:
Semiconductor Industry, Display Panels, Photovoltaic Industry, Low-emissivity Glass
Packaging Details:
Vacuum-sealed packaging, case-packed for storage and transport
Supply Ability:
Stable supply
Highlight:

Metal Molybdenum Sputtering Target

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Mo Metal Sputtering Target

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Molybdenum Metal Sputtering Target

Product Description

Molybdenum targets, a rising star in high-performance materials

With the continuous advancement of material science, molybdenum targets have emerged as a key driver in various fields. Molybdenum targets are critical across the semiconductor, display, photovoltaic, and high-end manufacturing sectors, delivering unique performance advantages that drive industrial innovation.

Excellent Properties of Molybdenum Targets

 

l Ultra-high Purity

 

Molybdenum targets typically have a high purity of ≥99.95%, with some reaching 5N (99.999%). Extremely low impurity content, such as Fe and Ni <50ppm, and O <200ppm, ensures stable electrical performance of sputtered films, laying a solid foundation for high-precision applications like semiconductor chip manufacturing.

 

 

l High-temperature Oxidation Resistance

 

With an ultra-high melting point of 2623℃, weight gain from oxidation in air at 1000℃ is <0.1mg/cm² (100 hours). For example, a photovoltaic company using Mo targets to prepare TCO films showed no failure after 500 hours under 85℃/85% RH testing, demonstrating outstanding stability in high-temperature and harsh environments.

 

 

l Precise Structure and Excellent Conductivity

 

Density: 10.28 g/cm³ (99% theoretical), grain size <50μm, flatness ≤0.05mm (Φ100mm target). Excellent conductivity of high-purity Mo (resistivity 5.2 μΩ·cm) ensures efficient current transfer during sputtering, improving sputtering efficiency. The precise structural design is compatible with high-precision sputtering equipment, ensuring coating accuracy and uniformity.

 

 Applications of Molybdenum Targets

 

l Semiconductor Industry

 

Molybdenum targets are used in the semiconductor industry to prepare bottom electrodes for metal silicon wafers, providing stable current and ensuring wafer quality.

 

 

l Display Panels

 

Molybdenum target material is used in liquid crystal displays (LCDs) to enhance brightness, contrast, color, and lifespan.

 

 

l Photovoltaic Industry

 

Molybdenum targets are used in solar cell manufacturing as electrode materials, improving conversion efficiency.

 

 

l Low-emissivity Glass

 

Molybdenum targets are used in the production of STN/TN/TFT-LCDs and low-emissivity glass, suitable for various coating systems.